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| A '''solid immersion lens''' (SIL) has higher [[magnification]] and higher [[numerical aperture]] than common [[lens (optics)|lenses]] by filling the object space with a high-[[index of refraction|refractive-index]] solid material. SIL was originally developed for enhancing the [[spatial resolution]] of [[optical microscopy]].
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| <ref>Wu et al. [http://apl.aip.org/resource/1/applab/v75/i26/p4064_s1 Realization of numerical aperture 2.0 using a gallium phosphide solid immersion lens] Applied Physics Letters '''75(26)''' 4064 (1999). | |
| </ref> There are two types of SIL:
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| * Hemispherical SIL: Theoretically capable of increasing the numerical aperture of an optical system by <math>n</math>, the index of refraction of the material of the lens.
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| * Weierstrass SIL (''superhemispherical SIL'' or ''superSIL''): the height of the truncated sphere is <math>(1+1/n)r</math>, where r is the radius of the spherical surface of the lens. Theoretically capable of increasing the numerical aperture of an optical system by <math>n^2</math>.
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| ==Applications of SIL==
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| === Solid immersion lens microscopy ===
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| All optical microscopes are [[diffraction-limited]] because of the [[wave nature]] of light. Current research focuses on techniques to go beyond this limit known as the [[Rayleigh criterion]]. The use of SIL can achieve spatial resolution better than the diffraction limit in air, for both [[far-field]] imaging and [[near-field optics|near-field]] imaging.
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| ===Optical data storage===
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| Because SIL provides high spatial resolution, the spot size of [[laser]] beam through the SIL can be smaller than diffraction limit in air, and the density of the associated optical data storage can be increased.
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| ===Photolithography===
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| Similar to [[immersion lithography]], the use of SIL can increase spatial resolution of projected [[photolithography|photolithographic]] patterns, creating smaller components on [[Wafer (electronics)|wafers]].
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| == References == | |
| <references/>
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| [[Category:Microscope components]]
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| [[Category:Lenses]]
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| [[Category:Heat-assisted magnetic recording]]
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Revision as of 02:54, 1 March 2014
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